|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 3 of 15 found articles
| Title: |
Dielectric characterization of microwave plasma enhanced chemical vapor deposition diamond films with Ar–H2–CH4 gas mixture |
| Author: |
Ye, Haitao Sun, Chang Q. Hing, Peter |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 132 (2000) nr. 1 pages 5 p. |
| Year: |
2000 |
| Contents: | |
| Publisher: |
Elsevier Science S.A. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 3 of 15 found articles
| << previous | next >> |