|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 52 of 77 found articles
| Title: |
Plasma sources and characterization in the r.f. test facility |
| Author: |
Yang, J.G Kim, W.S Chung, Y.S Choi, J.H Yoon, N.S You, K.-I Choi, J.W Kim, B.C Kyum, M.C Na, H.K Hong, J Lee, G.S Hwang, S.M Huh, J.H Ryu, C.M Sim, J.H Son, D.C Hong, S.J |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 112 (1999) nr. 1-3 pages 4 p. |
| Year: |
1999 |
| Contents: | |
| Publisher: |
Elsevier Science S.A. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 52 of 77 found articles
| << previous | next >> |