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                                       Details for article 2 of 133 found articles
 
 
  Aluminum nitride nano-dots prepared by plasma enhanced chemical vapor deposition on Si(111)
 
 
Title: Aluminum nitride nano-dots prepared by plasma enhanced chemical vapor deposition on Si(111)
Author: Bouchkour, Z.
Tristant, P.
Thune, E.
Dublanche-Tixier, C.
Jaoul, C.
Guinebretière, R.
Appeared in: Surface & coatings technology
Paging: Volume 205 (2011) nr. S2 pages 6 p.
Year: 2011
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 2 of 133 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands