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                                       Details for article 69 of 227 found articles
 
 
  Electron shading damage enhancement due to nonuniform in-hole etch rate in deep contact-hole process
 
 
Title: Electron shading damage enhancement due to nonuniform in-hole etch rate in deep contact-hole process
Author: Lee, Jeongyun
Kim, Seok-Nyeon
Kim, Dong-Hwan
Chung, Ilsub
Appeared in: Surface & coatings technology
Paging: Volume 205 (2010) nr. S1 pages 5 p.
Year: 2010
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 69 of 227 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands