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Journal description
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Details for article 206 of 227 found articles
| Title: |
The effect of plasma deposition on the electrical characteristics of Pt/HfOx/TiN RRAM device |
| Author: |
Liu, Kou-Chen Tzeng, Wen-Hsien Chang, Kow-Ming Wu, Chi-Hung |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 205 (2010) nr. S1 pages 6 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 206 of 227 found articles
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