|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 71 of 111 found articles
| Title: |
Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell |
| Author: |
Cho, Young Joon Cha, Hamchorom Chang, Hyo Sik |
| Appeared in: |
Surface & coatings technology |
| Paging: | Volume 307 (2016) nr. PB pages 4 p. |
| Year: |
2016 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 71 of 111 found articles
| << previous | next >> |