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Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application |
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Titel: |
Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application |
Auteur: |
Qiu, Peng Wei, Huiyun An, Yunlai Wu, Qixin Du, Wenxin Jiang, Zengxuan Zhou, Lang Gao, Chuang Liu, Sanjie He, Yingfeng Song, Yimeng Peng, Mingzeng Zheng, Xinhe |
Verschenen in: |
Ceramics international |
Paginering: |
Jaargang 46 () nr. 5 pagina's 5765-5772 |
Jaar: |
2020 |
Inhoud: |
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Uitgever: |
Elsevier Ltd and Techna Group S.r.l. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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