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Journal description
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Details for article 33 of 222 found articles
| Title: |
Deposition of nanostructured thin films using an inductively coupled plasma chemical vapor deposition technique |
| Author: |
Lee, Y.C. Tan, O.K. Tse, M.S. Srivastava, A. |
| Appeared in: |
Ceramics international |
| Paging: | Volume 30 (2004) nr. 7 pages 4 p. |
| Year: |
2004 |
| Contents: | |
| Publisher: |
Techna Group S.r.l. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 33 of 222 found articles
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