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Journal description
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Details for article 5 of 55 found articles
| Title: |
Charge transfer resistance of copper and nickel thin film electrodes in nano dimensions |
| Author: |
Wang, Shulan Li, Jiulong Zhang, Rongxia Li, Li |
| Appeared in: |
Materials letters |
| Paging: | Volume 198 (2017) nr. C pages 4 p. |
| Year: |
2017 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 5 of 55 found articles
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