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Journal description
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Details for article 49 of 80 found articles
| Title: |
Material removal rate model for chemical–mechanical polishing of single-crystal SiC substrates using agglomerated diamond abrasive |
| Author: |
Wu, Pengfei Liu, Ning Li, Xue Zhu, Yongwei |
| Appeared in: |
Precision engineering |
| Paging: | Volume 88 () nr. C pages 572-583 |
| Year: |
2024 |
| Contents: | |
| Publisher: |
Elsevier Inc. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 49 of 80 found articles
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