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Journal description
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Details for article 41 of 75 found articles
| Title: |
Microstructure and chemical analysis of Hf-based high-k dielectric layers in metal–insulator–metal capacitors |
| Author: |
Thangadurai, P. Mikhelashvili, V. Eisenstein, G. Kaplan, W.D. |
| Appeared in: |
Thin solid films |
| Paging: | Volume 518 (2010) nr. 15 pages 6 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 41 of 75 found articles
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