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                                       Details for article 8 of 21 found articles
 
 
  Diffusion of aluminum into silicon nitride films
 
 
Title: Diffusion of aluminum into silicon nitride films
Author: Ogata, H.
Kanayama, K.
Ohtani, M.
Fujiwara, K.
Abe, H.
Nakayama, H.
Appeared in: Thin solid films
Paging: Volume 48 (1978) nr. 3 pages 6 p.
Year: 1978
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 8 of 21 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands