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Journal description
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Details for article 24 of 27 found articles
| Title: |
Surface chemistry and film growth during TiN atomic layer deposition using TDMAT and NH3 |
| Author: |
Elam, J.W Schuisky, M Ferguson, J.D George, S.M |
| Appeared in: |
Thin solid films |
| Paging: | Volume 436 (2003) nr. 2 pages 12 p. |
| Year: |
2003 |
| Contents: | |
| Publisher: |
Elsevier Science B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 24 of 27 found articles
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