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Journal description
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Details for article 6 of 14 found articles
| Title: |
Impact of within-wafer process variability on radiation response |
| Author: |
Hu, Zhiyuan Liu, Zhangli Shao, Hua Zhang, Zhengxuan Ning, Bingxu Chen, Ming Bi, Dawei Zou, Shichang |
| Appeared in: |
Microelectronics journal |
| Paging: | Volume 42 () nr. 6 pages 883-888 |
| Year: |
2011 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 6 of 14 found articles
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