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Journal description
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Details for article 12 of 14 found articles
| Title: |
The effects of implantation dose and anneal temperature on the layered structure and electrical properties of oxygen-ion-implanted silicon-on-insulator |
| Author: |
Dutta, Pradip K. Cristoloveanu, Sorin |
| Appeared in: |
Microelectronics journal |
| Paging: | Volume 22 () nr. 7-8 pages 67-76 |
| Year: |
1991 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 14 found articles
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