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Investigation on negative capacitance FinEFT beyond 7 nm node from device to circuit |
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Title: |
Investigation on negative capacitance FinEFT beyond 7 nm node from device to circuit |
Author: |
Huo, Jiali Huang, Weixing Zhang, Fan Zhang, Shengli Gan, Weizhuo Huo, Qiang Cai, Yuwei Zhang, Qingzhu Li, Yongliang Zhu, Huilong Yin, Huaxiang Wu, Zhenhua |
Appeared in: |
Microelectronics journal |
Paging: |
Volume 116 () nr. C pages p. |
Year: |
2021 |
Contents: |
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Publisher: |
Published by Elsevier B.V. |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
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