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Journal description
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Details for article 13 of 22 found articles
| Title: |
On the annealing temperature, penetration depth of oxygen and film thickness on the DC and AC electrical properties and nano-structure of Ti thin films |
| Author: |
Khojier, K. Savaloni, H. |
| Appeared in: |
Vacuum |
| Paging: | Volume 84 (2010) nr. 6 pages 8 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 13 of 22 found articles
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