|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 8 of 29 found articles
| Title: |
Etch damage characteristics of TiO2 thin films by capacitively coupled RF Ar plasmas |
| Author: |
Kawakami, Retsuo Tominaga, Kikuo Okada, Kenji Nouda, Takahiro Inaoka, Takeshi Takeichi, Atsushi Fukudome, Toshiaki Murao, Kenichi |
| Appeared in: |
Vacuum |
| Paging: | Volume 84 (2010) nr. 12 pages 5 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 29 found articles
| << previous | next >> |