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Journal description
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Details for article 3 of 13 found articles
| Title: |
Chemical structure and electrical properties of sputtered HfO2 films on Si substrates annealed by rapid thermal annealing |
| Author: |
Tan, Tingting Liu, Zhengtang Lu, Hongcheng Liu, Wenting Yan, Feng |
| Appeared in: |
Vacuum |
| Paging: | Volume 83 (2009) nr. 9 pages 4 p. |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 3 of 13 found articles
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