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Journal description
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Details for article 3 of 19 found articles
| Title: |
Diluting and annealing effects on electromigration and morphology of chemical vapor-deposited copper films |
| Author: |
Wu, S. Li, X.-F. Liu, X. Wang, Q. |
| Appeared in: |
Vacuum |
| Paging: | Volume 80 (2006) nr. 8 pages 5 p. |
| Year: |
2006 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 3 of 19 found articles
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