Application of ion implantation for mono-Si piezoresistors manufacturing in silicon MEMS technology
Titel:
Application of ion implantation for mono-Si piezoresistors manufacturing in silicon MEMS technology
Auteur:
Jaroszewicz, B. Domanski, K. Tomaszewski, D. Janus, P. Kudla, A. Latecki, B. Kociubinski, A. Nikodem, M. Katcki, J. Wzorek, M. Marczewski, J. Grabiec, P.