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Journal description
All volumes of the corresponding journal
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Details for article 9 of 58 found articles
| Title: |
Control of Cl2 plasma by electron-beam-excited plasma and poly-Si etching |
| Author: |
Mikawa, Yasuhiro Miyano, Ryu-ichi Inaguma, Jun-ichi Shiraki, Yasunori Mutsuga, Futoshi Fujii, Motoyuki Ikezawa, Shunjiro |
| Appeared in: |
Vacuum |
| Paging: | Volume 51 (1998) nr. 4 pages 5 p. |
| Year: |
1998 |
| Contents: | |
| Publisher: |
Elsevier Science Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 9 of 58 found articles
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