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Journal description
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Details for article 18 of 22 found articles
| Title: |
Simulation of silicon dry etching through a mask in low pressure fluorine-based plasma |
| Author: |
Knizikevičius, R Galdikas, A Grigonis, A Pranevičius, L Rutkūnienë, Ž |
| Appeared in: |
Vacuum |
| Paging: | Volume 47 (1996) nr. 12 pages 5 p. |
| Year: |
1996 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 18 of 22 found articles
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