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                                       Details for article 14 of 39 found articles
 
 
  Photoresist silylation and dry development for sub-micron photolithography
 
 
Title: Photoresist silylation and dry development for sub-micron photolithography
Author: Zhou, R
Allsopp, DWE
Law, ME
Wood, J
El Gomati, MM
Appeared in: Vacuum
Paging: Volume 43 (1992) nr. 1-2 pages 4 p.
Year: 1992
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 14 of 39 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands