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Journal description
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Details for article 60 of 80 found articles
| Title: |
Significance of charge exchange in the determination of yields in broad-beam ion etching |
| Author: |
Villalvilla, JM Santos, C Vallés-Abarca, JA |
| Appeared in: |
Vacuum |
| Paging: | Volume 39 (1989) nr. 7-8 pages 3 p. |
| Year: |
1989 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 60 of 80 found articles
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