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                                       Details for article 25 of 46 found articles
 
 
  O+, O2 +, O3 + and O4 + ions in ArO2 sputtering discharges: comments on “Oxidation mechanism in rf CO2 plasma”, Vacuum, 36, 85 (1986)
 
 
Title: O+, O2 +, O3 + and O4 + ions in ArO2 sputtering discharges: comments on “Oxidation mechanism in rf CO2 plasma”, Vacuum, 36, 85 (1986)
Author: Aita, Carolyn Rubin
Marhic, Michel E
Appeared in: Vacuum
Paging: Volume 38 (1988) nr. 1 pages 2 p.
Year: 1988
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 25 of 46 found articles
 
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