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Journal description
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Details for article 60 of 95 found articles
| Title: |
Low damage atomic layer etching technology for gate recessed fabrication |
| Author: |
Guo, J.Q. Wei, K. Zhang, S. He, X.Q. Zhang, Y.C. Zhang, R.Z. Wang, J.C. Wang, K.Y. Huang, S. Zheng, Y.K. Wang, X.H. Liu, X.Y. |
| Appeared in: |
Vacuum |
| Paging: | Volume 217 () nr. C pages p. |
| Year: |
2023 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 60 of 95 found articles
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