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Journal description
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Details for article 209 of 231 found articles
| Title: |
The influence of carbon dioxide on the growth mechanism of silicon autoepitaxial films during vacuum deposition |
| Author: | |
| Appeared in: |
Vacuum |
| Paging: | Volume 21 (1971) nr. 8 pages 2 p. |
| Year: |
1971 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 209 of 231 found articles
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