Formation of HfOxNy nanorod GLAD films growth by rapid thermal oxidation
Titel:
Formation of HfOxNy nanorod GLAD films growth by rapid thermal oxidation
Auteur:
Phae-ngam, W. Prathumsit, J. Chananonnawathorn, C. Nakajima, H. Lertvanithphol, T. Pogfay, T. Limsuwan, N. Phokharatkul, D. Vora-ud, A. Triamnak, N. Mungchamnankit, A. Horprathum, M. Limsuwan, P.