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Vertical sidewall of silicon nitride mask and smooth surface of etched-silicon simultaneously obtained using CHF3/O2 inductively coupled plasma |
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Titel: |
Vertical sidewall of silicon nitride mask and smooth surface of etched-silicon simultaneously obtained using CHF3/O2 inductively coupled plasma |
Auteur: |
Sun, Jiabao Chen, Zhengyang Zhou, Shiqi Sun, Yijun Liu, Zhi Chen, Changhong Liu, Yanhua Sun, Ying Wang, Meifang Xie, Shijian Liu, Wucan Zeng, Qun Wu, Haifeng Bai, Zhanqi |
Verschenen in: |
Vacuum |
Paginering: |
Jaargang 207 () nr. C pagina's p. |
Jaar: |
2023 |
Inhoud: |
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Uitgever: |
Elsevier Ltd |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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