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Journal description
All volumes of the corresponding journal
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All articles of the corresponding issues
Details for article 32 of 80 found articles
| Title: |
Excellent diffusion barrier property of amorphous NbMoTaW medium entropy alloy thin films used in Cu/Si Connect System |
| Author: |
Hu, K. Hu, Q.F. Xu, X. Chen, S.H. Ma, J. Dong, W.W. |
| Appeared in: |
Vacuum |
| Paging: | Volume 202 () nr. C pages p. |
| Year: |
2022 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 32 of 80 found articles
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