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Journal description
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Details for article 22 of 52 found articles
| Title: |
Hydrogen microwave plasma etching of silicon dioxide at high temperatures with in situ low-coherence interferometry control |
| Author: |
Yurov, V. Yu Bolshakov, A.P. Altakhov, A.S. Fedorova, I.A. Zavedeev, E.V. Popovich, A.F. Ralchenko, V.G. |
| Appeared in: |
Vacuum |
| Paging: | Volume 199 () nr. C pages p. |
| Year: |
2022 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 22 of 52 found articles
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