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Journal description
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Details for article 23 of 69 found articles
| Title: |
Effects of process parameters and chamber structure on plasma uniformity in a large-area capacitively coupled discharge |
| Author: |
Zhou, Jicheng Liao, Jia Huang, Jing Chen, Techao Lv, Bowen Peng, Yichang |
| Appeared in: |
Vacuum |
| Paging: | Volume 195 () nr. C pages p. |
| Year: |
2022 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 23 of 69 found articles
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