|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 32 of 65 found articles
| Title: |
Importance of tailoring the thickness of SiO2 interlayer in the observation of ferroelectric characteristics in yttrium doped HfO2 films on silicon |
| Author: |
Sun, Nana Zhou, Dayu Liu, Wenwen Zhang, Yu Li, Shuaidong Wang, Jingjing Ali, Faizan |
| Appeared in: |
Vacuum |
| Paging: | Volume 183 () nr. C pages p. |
| Year: |
2021 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 32 of 65 found articles
| << previous | next >> |