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Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 6 of 64 found articles
| Title: |
Comparison of plasma properties in normal and multiple holes hollow cathode RF PECVD and their utility in a-SiNx:H thin film deposition |
| Author: |
Sahu, B.B. Kim, Seok H. Lee, J.S. Han, Jeon G. |
| Appeared in: |
Vacuum |
| Paging: | Volume 160 (2019) nr. C pages 316-324 |
| Year: |
2019 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 6 of 64 found articles
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