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Journal description
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Details for article 33 of 47 found articles
| Title: |
On the relationships between plasma chemistry, etching kinetics and etching residues in CF4+C4F8+Ar and CF4+CH2F2+Ar plasmas with various CF4/C4F8 and CF4/CH2F2 mixing ratios |
| Author: |
Lee, Jaemin Efremov, Alexander Kwon, Kwang-Ho |
| Appeared in: |
Vacuum |
| Paging: | Volume 148 (2018) nr. C pages 214-223 |
| Year: |
2018 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 33 of 47 found articles
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