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                                       Details for article 16 of 19 found articles
 
 
  Stable reactive deposition of amorphous Al2O3 films with low residual stress and enhanced toughness using pulsed dc magnetron sputtering with very low duty cycle
 
 
Title: Stable reactive deposition of amorphous Al2O3 films with low residual stress and enhanced toughness using pulsed dc magnetron sputtering with very low duty cycle
Author: Kohout, Jiří
Bousser, Etienne
Schmitt, Thomas
Vernhes, Richard
Zabeida, Oleg
Klemberg-Sapieha, Jolanta
Martinu, Ludvik
Appeared in: Vacuum
Paging: Volume 124 (2016) nr. C pages 5 p.
Year: 2016
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 16 of 19 found articles
 
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