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                                       Details for article 14 of 19 found articles
 
 
  Peak amplitude of target current determines deposition rate loss during high power pulsed magnetron sputtering
 
 
Title: Peak amplitude of target current determines deposition rate loss during high power pulsed magnetron sputtering
Author: Greczynski, G.
Hultman, L.
Appeared in: Vacuum
Paging: Volume 124 (2016) nr. C pages 4 p.
Year: 2016
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 14 of 19 found articles
 
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