|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 44 of 87 found articles
| Title: |
Low temperature deposition of SiO x insulator film with newly developed facing electrodes chemical vapor deposition |
| Author: |
Matsuda, Tokiyoshi Furuta, Mamoru Hiramatsu, Takahiro Furuta, Hiroshi Kawaharamura, Toshiyuki Hirao, Takashi |
| Appeared in: |
Vacuum |
| Paging: | Volume 101 (2014) nr. C pages 4 p. |
| Year: |
2014 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 44 of 87 found articles
| << previous | next >> |