Accurate lifetime prediction for channel hot carrier stress on sub-1nm equivalent oxide thickness HK/MG nMOSFET with thin titanium nitride capping layer
Titel:
Accurate lifetime prediction for channel hot carrier stress on sub-1nm equivalent oxide thickness HK/MG nMOSFET with thin titanium nitride capping layer
Auteur:
Luo, Weichun Yang, Hong Wang, Wenwu Xu, Yefeng Tang, Bo Ren, Shangqing Xu, Hao Wang, Yanrong Qi, Luwei Yan, Jiang Zhu, Huilong Zhao, Chao Chen, Dapeng Ye, Tianchun