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Measurement of stresses in Cu and Si around through-silicon via by synchrotron X-ray microdiffraction for 3-dimensional integrated circuits |
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Titel: |
Measurement of stresses in Cu and Si around through-silicon via by synchrotron X-ray microdiffraction for 3-dimensional integrated circuits |
Auteur: |
Budiman, A.S. Shin, H.-A.-S. Kim, B.-J. Hwang, S.-H. Son, H.-Y. Suh, M.-S. Chung, Q.-H. Byun, K.-Y. Tamura, N. Kunz, M. Joo, Y.-C. |
Verschenen in: |
Microelectronics reliability |
Paginering: |
Jaargang 52 (2012) nr. 3 pagina's 4 p. |
Jaar: |
2012 |
Inhoud: |
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Uitgever: |
Elsevier Ltd |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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