|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 6 of 26 found articles
| Title: |
Effect of additive N2 and Ar gases on surface smoothening and fracture strength of Si wafers during high-speed chemical dry thinning |
| Author: |
Heo, W. Lee, N.-E. |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 52 (2012) nr. 2 pages 6 p. |
| Year: |
2012 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 6 of 26 found articles
| << previous | next >> |