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Journal description
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Details for article 63 of 117 found articles
| Title: |
HCI and NBTI induced degradation in gate-all-around silicon nanowire transistors |
| Author: |
Huang, Ru Wang, Runsheng Liu, Changze Zhang, Liangliang Zhuge, Jing Tao, Yu Zou, Jibin Liu, Yuchao Wang, Yangyuan |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 51 (2011) nr. 9-11 pages 6 p. |
| Year: |
2011 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 63 of 117 found articles
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