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                                       Details for article 55 of 140 found articles
 
 
  Experimental and simulated dc degradation of GaN HEMTs by means of gate-drain and gate-source reverse bias stress
 
 
Title: Experimental and simulated dc degradation of GaN HEMTs by means of gate-drain and gate-source reverse bias stress
Author: Di Lecce, Valerio
Esposto, Michele
Bonaiuti, Matteo
Meneghesso, Gaudenzio
Zanoni, Enrico
Fantini, Fausto
Chini, Alessandro
Appeared in: Microelectronics reliability
Paging: Volume 50 (2010) nr. 9-11 pages 5 p.
Year: 2010
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 55 of 140 found articles
 
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