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Journal description
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Details for article 21 of 21 found articles
| Title: |
The self-formatting barrier characteristics of Cu–Mg/SiO2 and Cu–Ru/SiO2 films for Cu interconnects |
| Author: |
Yi, Seol-Min Jang, Kwang-Ho An, Jung-Uk Hwang, Sang-Soo Joo, Young-Chang |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 48 (2008) nr. 5 pages 5 p. |
| Year: |
2008 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 21 of 21 found articles
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