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                                       Details for article 4 of 46 found articles
 
 
  Analysis of Cu/low-k bond pad delamination by using a novel failure index
 
 
Title: Analysis of Cu/low-k bond pad delamination by using a novel failure index
Author: van Gils, M.A.J.
van der Sluis, O.
Zhang, G.Q.
Janssen, J.H.J.
Voncken, R.M.J.
Appeared in: Microelectronics reliability
Paging: Volume 47 (2007) nr. 2-3 pages 8 p.
Year: 2007
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 4 of 46 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands