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Journal description
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Details for article 11 of 24 found articles
| Title: |
Gate metal interdiffusion induced degradation in space-qualified GaAs PHEMTs |
| Author: |
Chou, Y.C. Leung, D. Grundbacher, R. Lai, R. Kan, Q. Liu, P.H. Eng, D. Block, T. Oki, A. |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 46 (2006) nr. 1 pages 17 p. |
| Year: |
2006 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 11 of 24 found articles
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