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                                       Details for article 15 of 17 found articles
 
 
  Reliability of Au bump––Cu direct interconnections fabricated by means of surface activated bonding method
 
 
Title: Reliability of Au bump––Cu direct interconnections fabricated by means of surface activated bonding method
Author: Wang, Qian
Hosoda, Naoe
Itoh, Toshihiro
Suga, Tadatomo
Appeared in: Microelectronics reliability
Paging: Volume 43 (2003) nr. 5 pages 6 p.
Year: 2003
Contents:
Publisher: Elsevier Science Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 15 of 17 found articles
 
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