|
| << previous |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 25 of 25 found articles
| Title: |
Ultra-shallow n+p junction formed by PH3 and AsH3 plasma immersion ion implantation |
| Author: |
Yang, B.L Cheung, N.W Denholm, S Shao, J Wong, H Lai, P.T Cheng, Y.C |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 42 (2002) nr. 12 pages 5 p. |
| Year: |
2002 |
| Contents: | |
| Publisher: |
Elsevier Science Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 25 of 25 found articles
| << previous |