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Journal description
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Details for article 3 of 80 found articles
| Title: |
Annealing effects in the PECVD SiO2 thin films deposited using TEOS, Ar and O2 mixture |
| Author: |
Viana, C.E Morimoto, N.I Bonnaud, O |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 40 (2000) nr. 4-5 pages 4 p. |
| Year: |
2000 |
| Contents: | |
| Publisher: |
Elsevier Science Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 3 of 80 found articles
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